Course: Nanomaterials and Technology of Preparation

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Course title Nanomaterials and Technology of Preparation
Course code UFY/450
Organizational form of instruction Lecture
Level of course Bachelor
Year of study not specified
Frequency of the course In each academic year, in the summer semester.
Semester Summer
Number of ECTS credits 3
Language of instruction Czech, English
Status of course Compulsory-optional
Form of instruction unspecified
Work placements unspecified
Recommended optional programme components None
Lecturer(s)
  • Čada Martin, Mgr. Ph.D.
Course content
Content of lectures: 1. Materials Classification of materials according to their structure, composition and basic properties. Basic principles of material engineering and its application for the fabrication of nanostructured materials. 2. Solid state Fundamentals of solid state theory. Fundamentals of quantum description of the electronic structure of atoms and solids. Basic concepts of crystal structure of substances. Definition of a nanomaterial and its relation to the structure of a substance. 3. Surfaces Fundamentals of thin film physics. Definitions and applications in industry. Basic differences between the physical properties of solids and thin films. Applications of thin films in various fields of human activities. Thin films in the semiconductor industry, biotechnology, sensors, energy and engineering. 4. Applications of thin films in industry Principles of thin film growth. Basic methods of thin film preparation. Physical properties of thin films influenced by the method used. Basic procedures for the preparation of nanostructured thin films. 5. Measurement methods Methods for studying the properties of materials. Basic overview of key analytical methods for materials research. Measurement of structure, composition and properties of thin films - SEM, TEM, XPS, GDOES, XRD, Raman spectroscopy, AFM, nanoindentation. 6. High Performance Semiconductors Materials and thin films for the semiconductor industry. Basic material requirements to enable the fabrication of high power switching transistors. Nanoscale material properties. The use of 3D nanostructuring for the preparation of fast gates and increasing their surface density. 7. Hard, protective films Hard and abrasion resistant layers. Examples of the type of materials, their preparation and practical applications. The use of plasma techniques to optimise the physical properties of hard layers and the possibilities of their application in new technologies for their preparation. 8. Nanostructures for energy Nanostructured and functional materials for electrical energy storage in batteries. Materials for increasing energy density in batteries. Fundamentals of the theory of materials exhibiting high ionic conductivity. Issues in the development of solid-state batteries. New trends in the development of materials for next generation batteries. 9. Magnetic materials Ferroelectric and ferromagnetic materials for modern memory devices. Fundamentals of spintronics and its application to future digital technology. Nanomaterials suitable for the preparation of thin films for use in spintronics. 10. Carbon materials Modern carbon-based materials - fullerenes, carbon nanotubes, carbon foam, graphene, diamond-like carbon. Their use for electrical energy storage, catalysis of volatile organic compounds, photocatalysis or for use as tribological thin films. 11. Dielectric materials Thin film dielectric (nano)materials for energy storage and fuel cell applications. High-k materials for supercapacitors. Fuel cells for electricity generation from green sources (hydrogen, biomethane, etc.) 12. Semiconductors and quantum nanomaterials Thin film materials for advanced imaging and photocells. Brief description of the principles of liquid crystal operation. Modern semiconductor materials for LEDs. Materials for new light sources and imaging such as OLED or laser. Material trends for the development of more efficient solar cells.

Learning activities and teaching methods
Monologic (reading, lecture, briefing)
  • Preparation for classes - 26 hours per semester
  • Preparation for exam - 25 hours per semester
  • Class attendance - 28 hours per semester
Learning outcomes
The course aims to introduce the student to the fundamentals of low-pressure physics and vacuum technology. Therefore, about half of the course is devoted to molecular physics in a gaseous environment, including elementary processes in the gas volume and processes onto/into walls of vacuum systems. The fundamental physics of gas pumping is also a part of the lecture. The second half of the course aims to introduce vacuum technology systems (pumps, gauges), the design of vacuum systems and their use in technological applications.

Prerequisites
Basic knowledge of mechanics and molecular physics.

Assessment methods and criteria
Oral examination

Knowledge and overview in the frame of lectured topics.
Recommended literature
  • A. J. Dekker: Solid state physics, Prentice-Hall Englewood Cliffs 1958.
  • A. Zangwill: Physics at Surfaces, Cambridge University Press Cambridge 1988.
  • B. Rous: Materiály pro elektroniku a mikroelektroniku, SNTL Praha 1991.
  • H. Bubert, H. Jenett: Surfaces and Thin Films Analysis: Principles, Instrumentation, Applications, Wiley-VCH Verlag Weinheim 2002.
  • H. Bubert, H. Jenett: Surfaces and Thin Films Analysis: Principles, Instrumentation, Applications, Wiley-VCH Verlag Weinheim 2002.
  • H. Czichos, T. Saito, L. Smith: Handbook of Materials Measurement Methods, Springer Verlag 2006.
  • L. Eckertová: Fyzikální elektronika pevných látek, UK Praha 1992.
  • L. Eckertová: Metody analýzy povrchů - elektronová mikroskopie a difrakce, Academia Praha 1996.
  • P. M. Martin: Handbook of Deposition Technologies for Films and Coatings, Elsevier Oxford (2010)..


Study plans that include the course
Faculty Study plan (Version) Category of Branch/Specialization Recommended year of study Recommended semester