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Lecturer(s)
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Straňák Vítězslav, prof. RNDr. Ph.D.
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Course content
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1. Introduction to vacuum physics, kinetic theory of gases 2. Processes in gas volume 3. Gas interaction with surfaces, adsorption of molecules 4. Processes in walls and gas wall interactions: absorption, diffusion, permation, outgasing, leaks 5. Low pressure physics: gas pumping, gas flow and gas flow conductance (calculations) 6. Low pressure physics: vacuum pumps 7. Measuremets of low pressures: principles, gauges 8. Complex vacuum systems, plasma-chemical reactors 9. Specifical aspects of plasma for technological processes 10. Deposition of thin films I: PVD methods, magnetron sputtering deposition 11. Deposition of thin films II: advanced PVD methods, HiPIMS, RF, nanostructures and nanoparticles 12. Deposition of thin films III: PECVD processes, plasma-polymers 13. Other plasma based technologies: implantation, etching, bio-medicine, etc.
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Learning activities and teaching methods
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Monologic (reading, lecture, briefing), Demonstration, Laboratory
- Class attendance
- 28 hours per semester
- Preparation for classes
- 20 hours per semester
- Preparation for exam
- 20 hours per semester
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Learning outcomes
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The aim of the course is to introduce the basic of vacuum physics, vacuum systems and the use of vacuum technologies in practice. Furthermore, the course makes introduction to modern plasma applications and technological processes, including the formation and deposition of thin functional layers, cluster formation, surface modification of materials and other applications such as bio-medicine, etc.
The student will get an overview of vacuum physics, basic aspects pumping systems, measurement of low pressures and technological processes. The gained knowledge can be utilized in further study or in practice.
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Prerequisites
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basic knowledge of mathematics, general physics and electricity and magnetism, basic knowledge of plasma physics
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Assessment methods and criteria
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Oral examination
Understanding of the topic within the frame given by the plan. Assesment methods and criteria linked to learning outcomes: exam: passing the test min 75%, proof of knowledge at the oral exam min 75%.
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Recommended literature
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J.R. Roth. Industrial Plasma Engineering: Applications.. Institute of Physics Pub, 2001.
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J.R. Roth. Industrial Plasma Engineering: Principles.. Institute of Physics Pub, 2001.
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K. Jousten. Handbook of Vacuum Technology. Wiley-Vch, 2008.
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M.A. Lieberman, A.J. Lichtenberg. Principles of plasma discharges and materials processing. J. Wiley, New York, 2005.
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R. Hippler, H. Kersten, M. Schmidt, K. H. Schoenbach. Low Temperature Plasma: Fundamentals, Technologies and Techniques. Wiley-VCH, 2008.
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