1. Introduction to plasma nanotechnology Introduction, nanotechnology and its applications, definition of "nano" dimensions 0D, 1D, 2D, 3D, principles of bottom-up, top-down growth, growth of nanostructures, Wulff's theorem, Gibbs energy, homogeneous and heterogeneous nucleation, applications. 2. Plasma surface engineering Definition of plasma, collision and ionization, basic plasma phenomena (sheath, oscillation, ambipolar diffusion), plasma discharges for nanotechnology, plasma-wall interaction, role of ionized particles, general scheme of nanostructure growth. 3. Advanced diagnostics for deposition optimization I: plasma diagnostics Diagnostic methods (in-situ, in-time) for optimized deposition, internal plasma parameters, probe measurements, optical emission and absorption spectroscopy, mass spectrometry, microwave interferometry, methods for determining basic plasma parameters; principles and methods of time-resolved measurements 4. Advanced diagnostics for deposition optimization II: surface analyzes Complex diagnostic methods, determination of deposition parameters, mass fluxes, ionization flux fractions, energy fluxes to substrate, characterization of thin films and nanostructures (overview of XPS, XRD, RS, FTIR, RBS, SIMS-TOF, SEM, TEM, AFM techniques) 5. Theory of nucleation, growth and film nanotexture (PVD) PVD (Physical Vapor Deposition), evaporation (sputtering), ion-plating, sputtering, Thorton's zone diagram, nucleation and layer growth, nucleation models and their thermodynamic description (3D Volmer-Weber, 2D Frank van der Merve, Stranski-Krastanow, structural evolution of polycrystalline layers (zone diagram), deposition control for defined layer growth 6. Sputtering of thin films - magnetron deposition PVD magnetron deposition, sputtering of targets, sputtering yield and their models, sputtering magnetron - design and principle, ion bombard target, reactive sputtering of thin films, hysteresis, RF magnetron - principle, induction of self-bias, surface preparation for deposition, sample cleaning 7. Advanced thin film sputtering methods - HiPIMS, nanocomposites Pulsed magnetron sputtering, principle, advantages, disadvantages, HiPIMS discharges (characteristics, applications), design of HiPIMS switching sources, reactive HiPIMS. Advanced pulsed discharge with bias. Nanocomposite deposition and multi-magnetron arrangements, magnetic field coupling. 8. Deposition of nanoparticles and GLAD structures Nanoparticles as 0D structure, aggregation of nanoparticles in gas (nucleation, coagulation, coalescence), nucleation theory and germ dimers, classical nucleation theory, nanoparticle size distribution, Haberland concept, multi-component nanoparticles core-shell, Janus, tripple-shell, design and technology of aggregation sources. Preparation of nanostructures under large angle deposition (GLAD). 9. PECVD - Plasma Enhanced Chemical Vapour Deposition CVD - Chemical vapour deposition - mechanism, principle, reaction zone model, classification of CVD reactions, CVD layer growth, PECVD - role of plasma for efficient CVD, plasma-wall interaction in PECVD, PECVD reactors, examples of PECVD for deposition of selected functional layers 10. Plasma polymer preparation Plasma polymers, preparation of plasma polymers, deposition systems, plasma polymerization models (Denaro, Poll, Yasuda), types of plasma polymers and their properties, degradation and aging of plasma polymers, nanocomposites with plasma polymers, practical applications 11. Functionalization and surface modification, surface free energy Plasma surface treatment, bulk rf discharges and their role, active and reactive particles, plasma etching, surface functionalization, surface free energy, surface tension, Young's equation and wettability model, determination of surface free energy, hydrophilic and hydrophobic surfaces, Casie-Baxter and Wenzel wettability models, wettability of nanostructures 12. Advanced nanostructured surfaces Functional nanocomposites.
|
-
B. Bhushan, Springer Handbook of Nanotechnology, Springer-Verlag Berlin, (2010).
-
D.J. Whitehouse, Handbook of Surface and Nanometrology, CRC Press, New York, (2011).
-
D.M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing, Elsevier, (2010).
-
H. Frey, H.R. Khan, Handbook of Thin Film Technology, Springer Berlin, Heidelberg, (2015).
-
K. Ostrikov, Plasma Nanoscience, Wiley-VCH Verlag, Weinheim, (2008).
-
R. Hippler, H. Kersten, M. Schmidt, K. H. Schoenbach: Low Temperature Plasma,: Fundamentals, Technologies and Techniques, Wiley-VCH, (2008).
-
Y.Huttel, Gas-Phase Synthesis of Nanoparticles, Wiley-VCH Verlag GmbH, (2017).
|